Technical consultation fee
| Technical consultation fee (yen/hr) | 10,000 |
| Technical assistance fee (Preprocessing, Design, etc) (yen/hr) | 4,000 |
Nanofabrication
Nanofabrication support equipment price list (2018.10)
| Equipment | Model |
Introductory training fee |
Usage fee (Academic) |
Usage fee (Business Use) |
Technical Support (yen/hr) (Academic) |
Technical Support (yen/hr) (Business Use) |
Technical Service (yen/hr) (Academic) |
Technical Service (yen/hr) (Business Use) |
| Ultra-high precision electron-beam lithography system 125 kV | ELS-F125-U | 32,000 | 2,500 | 7,200 | 6,500 | 11,200 | 10,500 | 15,200 |
| Ultra-high precision electron-beam lithography system 100 kV | ELS-7000HM | 32,000 | 1,600 | 6,200 | 5,600 | 10,200 | 9,600 | 14,200 |
| Mask aligner | MA-20 | 12,000 | 400 | 1,100 | 4,400 | 5,100 | 8,400 | 9,100 |
| Laser lithography system | DDB-201-200 | 20,000 | 700 | 2,800 | 4,700 | 6,800 | 8,700 | 10,800 |
| Vacuum deposition system | ED-1500R | 20,000 | 500 | 1,000 | 4,500 | 5,000 | 8,500 | 9,000 |
| Plasma CVD system | PD-220ESN | 20,000 | 1,200 | 4,000 | 5,200 | 8,000 | 9,200 | 12,000 |
| Liquid source plasma CVD system | PD-10C1 | 20,000 | 300 | 400 | 4,300 | 4,400 | 8,300 | 8,400 |
| Helicon sputtering system | MPS-4000C1/HC1 | 12,000 | 2,000 | 3,200 | 6,000 | 7,200 | 10,000 | 11,200 |
| Ion beam sputter system | IBS-6000S | 12,000 | 700 | 1,200 | 4,700 | 5,200 | 8,700 | 9,200 |
| Atomic layer deposition system | SUNALE-R | 12,000 | 1,900 | 4,100 | 5,900 | 8,100 | 9,900 | 12,100 |
| ICP dry etching system | SPM-200 | 20,000 | 1,300 | 3,600 | 5,300 | 7,600 | 9,300 | 11,600 |
| Reactive ion etching system | RIE-101iPH | 12,000 | 1,600 | 3,700 | 5,600 | 7,700 | 9,600 | 11,700 |
| Reactive ion etching system | RIE-10NRV | 12,000 | 900 | 2,700 | 4,900 | 6,700 | 8,900 | 10,700 |
| Dry etching system | NLD-500 | 12,000 | 800 | 1,400 | 4,800 | 5,400 | 8,800 | 9,400 |
| Ion milling system | IBE-6000S | 12,000 | 600 | 900 | 4,600 | 4,900 | 8,600 | 8,900 |
| Field emission-type scanning electron microscope | JSM-6700FT | 20,000 | 800 | 900 | 4,800 | 4,900 | 8,800 | 8,900 |
| Electron beam lithography system | ELS-3700 | 24,000 |
1,300 |
2,100 | 5,300 | 6,100 | 9,300 | 10,100 |
| Electron beam lithography system | ELS-7300 | 64,000 | 1,600 | 5,000 | 5,600 | 9,000 | 9,600 | 13,000 |
| Double-side mask aligner | MA-6 | 64,000 | 700 | 2,700 | 4,700 | 6,700 | 8,700 | 10,700 |
| ECR processor | EIS-200ER | 40,000 | 900 | 1,500 | 4,900 | 5,500 | 8,900 | 9,500 |
| ICP processor | EIS-700S | 24,000 | 1,000 | 1,000 | 5,000 | 5,000 | 9,000 | 9,000 |
| Ultra-high vacuum helicon sputtering system | Av028 | 24,000 | 1,200 | 2,300 | 5,200 | 6,300 | 9,200 | 10,300 |
| ALD film formation system | Savannah 100 | 24,000 | 1,400 | 2,700 | 5,400 | 6,700 | 9,400 | 10,700 |
| Sputter system | SPF-210H | 24,000 | 300 | 500 | 4,300 | 4,500 | 8,300 | 8,500 |
| EB heating/resistant heating-type deposition system | EBX-8C | 16,000 | 2,300 | 2,600 | 6,300 | 6,600 | 10,300 | 10,600 |
| EB heating/resistant heating-type deposition system | AV096-000 | 16,000 | 1,300 | 2,400 | 5,300 | 6,400 | 9,300 | 10,400 |
| FIB processor | EIP-3300 | 40,000 | 1,500 | 1,900 | 5,500 | 5,900 | 9,500 | 9,900 |
| Easy tube system | Easy tube system | 40,000 | 400 | 400 | 4,400 | 4,400 | 8,400 | 8,400 |
| Ellipsometer | M-500S | 8,000 | 200 | 700 | 4,200 | 4,700 | 8,200 | 8,700 |
| High-speed scanning EB lithography system | ELS-F130HM | 32,000 | 5,500 | 25,500 | 9,500 | 29,500 | 13,500 | 33,500 |
| PAC-LMBE Compact Laser MB | PAC-LMBE | 32,000 | 1,500 | 4,900 | 5,500 | 8,900 | 9,500 | 12,900 |
| Surface Roughness Analysis SEM | ERA-8000FE | 32,000 | 1,100 | 1,200 | 5,100 | 5,200 | 9,100 | 9,200 |
| Compact sputter system | ACD-4000-C3-HS | 12,000 | 1,100 | 2,900 | 5,100 | 6,900 | 9,100 | 10,900 |
| ICP high-density plasma etching system | RIE-101iHS | 12,000 | 1,600 | 5,400 | 5,600 | 9,400 | 9,600 | 13,400 |
Microstructure Characterization
Microstructure Characterization support equipment price list (2018.10)
| Equipment | Model | Introductory training fee (yen) |
Usage fee (Academic) |
Usage fee (Business Use) |
Technical Support (yen/hr) (Academic) |
Technical Support (yen/hr) (Business Use) |
Technical Service (yen/hr) (Academic) |
Technical Service (yen/hr) (Business Use) |
| Field emission-type scanning electron microscope /FE-SEM |
JSM-6500F | 32,000 | 1,300 | 2,700 | 5,300 | 6,700 | 9,300 | 10,700 |
| Ultrahigh vacuum, ultralow temperature high-field SPM /SPM |
JAFM4500LT | 24,000 | 1,400 | 7,100 | 5,400 | 11,100 | 9,400 | 15,100 |
| Multi-beam ultrahigh-voltage electron microscope |
JEM-ARM1300 | 28,000 | 3,400 | 4,900 | 6,900 | 8,400 | 6,900 | 8,400 |
| Analysis TEM with a field emission-type electron gun |
JEM-2010F | 28,000 | 2,300 | 2,300 | 5,800 | 5,800 | 5,800 | 5,800 |
| Ultra-thin film evaluation system /STEM | HD-2000 | 16,000 | 2,700 | 7,400 | 6,700 | 11,400 | 10,700 | 15,400 |
| Convergence ion beam processing /observation system /FIB |
FB-2100 | 20,000 | 1,900 | 4,400 | 5,900 | 8,400 | 9,900 | 12,400 |
| Electron microscope system for environmental cells /TEM |
JEM2010 | 32,000 | 1,200 | 2,800 | 5,200 | 6,800 | 9,200 | 10,800 |
| Electron probe micro analyzer (FE-EPMA) | JXA-8530F | 32,000 | 2,700 | 7,900 | 6,700 | 11,900 | 10,700 | 15,900 |
| Combined beam processing /observation system /FIB-SEM |
JIB-4600F／HKD | 32,000 | 2,500 | 4,800 | 6,500 | 8,800 | 10,500 | 12,800 |
|
Combined beam processing |
JIB-4600F／HKD | 0 | 300 | 800 | 300 | 800 | 300 | 800 |
| Auger electron spectroscope /AES | JAMP-9500F | 28,000 | 2,300 | 8,100 | 5,800 | 11,600 | 5,800 | 11,600 |
| X-ray photoelectron spectroscope /XPS | JPS-9200 | 28,000 | 1,700 | 5,500 | 5,200 | 9,000 | 5,200 | 9,000 |
| Spin SEM | 24,000 | 2,000 | 2,400 | 6,000 | 6,400 | 10,000 | 10,400 | |
| Ultrahigh vacuum STM /spin-polarized STM system |
STM／AFM,VT-STM | 24,000 | 2,500 | 4,200 | 6,500 | 8,200 | 10,500 | 12,200 |
| Ultrahigh-speed time-resolved photoelectron microscope system |
PEEM-Ⅲ | 128,000 | 2,600 | 5,700 | 6,600 | 9,700 | 10,600 | 13,700 |
| Titan Transmission Electron Microscope FEI | Titan3 G2 60-300 | 28,000 | 7,500 | 31,400 | 11,000 | 34,900 | 11,000 | 34,900 |
| Atomic Resolution Analytical Electron Microscope | JEM-ARM200F | 40,000 | 4,500 | 16,000 | 8,500 | 20,000 | 12,500 | 24,000 |
| Scanning Probe Microscope | NanoNavi Station SPA300 | 32,000 | 200 | 400 | 4,200 | 4,400 | 8,200 | 8,400 |
| Ultrahigh vacuum, ultralow temperature high-field SPM | JAFM4500LT | 192,000 | 1,000 | 1,500 | 5,000 | 5,500 | 9,000 | 9,500 |