Support equipment

  • Nanofabrication
  • Microstructure Characterization

※Click the device name for details.

■Lithography technology

  • ELS-F125 Ultra-high precision electron-beam lithography system (Elionix)

  • ELS-7000HM Ultra-high precision electron-beam lithography system (Elionix)

  • ELS-3700 Electron-beam lithography system (Elionix)

  • ELS-7300 Electron-beam lithography system (Elionix)

  • DDB-201 Laser direct lithography system (Neoark)

  • MA-6 Double-side mask aligner (Suss MicroTec)

  • MA-20 Mask aligner (Mikasa)

  • Ultra high speed scanning and high precision electron beam lithography system

■Film formation technology

  • ED-1500R Vacuum deposition system (Sanvac)

  • EBX-8C EB heating/resistant heating-type deposition system (Ulvac)

  • EB heating/resistant heating-type deposition system (Suga)

  • PD-220ESN Plasma CVD system (Samco)

  • PD-10C1 Liquid-source plasma CVD system (Samco)

  • MPS-4000C1/HC1 Helicon sputtering system (Ulvac)

  • IBS-6000S Ion beam sputtering system (Ulvac)

  • ACD-4000-C3-HS Compact sputter system (Ulvac)

  • Av028 Ultra-high vacuum helicon sputtering system

  • SPF-210H Sputtering system (Anelva)

  • SUNALE-R Atomic layer deposition system (Picosun)

  • Savannah 100 ALD film-forming system (Cambridge NanoTech)

  • Nanocarbon growth furnace, easy tube system (Nano Device)

  • PAC-LMBE Compact Laser MB

■Etching technology

  • RIE-101iPH ICP high-density plasma etching system (Samco)

  • RIE-101iHS ICP high-density plasma etching system (Samco)

  • SPM-200 ICP dry etching system (Sumitomo Precision Products)

  • EIS-700 ICP processor (Elionix)

  • NLD-500 Dry etching system (Ulvac)

  • RIE-10NRV Reactive ion etching system (Samco)

  • IBE-6000S Ion milling system (Ulvac)

  • EIS-200ER ECR processor (Elionix)

■Evaluation technology

  • JSM-6700FT High-resolution field emission-type scanning electron microscope (JEOL)

  • M-500S Ellipsometer (JASCO)

■Other processing technologies

  • EIP-3300 FIB processor (Elionix)

■Other Open Facility Instruments

These are not part of the nano-technology platform instruments,
but inquiries and technical support are available.

  • SH-221 Environmental test device (Espec)

  • KH-7700 Digital microscope (Hirox)

  • WXS-156SL2, AM1.5GMM Solar cell evaluation system (Wacom)

  • PC-01-H Vacuum ultraviolet exposure system photo creator (N-Kobo)

※Click the device name for details.

■Ultrahigh-voltage electron microscope facility

  • JEM-ARM-1300 Multi-beam ultrahigh-voltage electron microscope (JEOL)

  • H-1300 Laser ultrahigh-voltage electron microscope (JEOL)

■Electron microscopes

  • JSM-6500FA Field emission-type scanning electron microscope (JEOL)

  • Spin SEM (developed jointly by Eiko Engineering and Hokkaido University)

  • JEM-2010F Analysis TEM with a field emission-type electron gun (JEOL)

  • JEM-2010 (UHR) Electron microscope system for environmental cells (JEOL)

  • HD-2000 Ultra-thin film evaluation system STEM (Hitachi High-Technologies)

  • Ultrahigh-speed time-resolved photoelectron microscope system (TR-PEEM)

  • JEM-ARM200F Atomic Resolution Analytical Electron Microscope

  • Titan Transmission Electron Microscope FEI

■Biological microscopes

  • A1 High-speed laser confocal microscope for spectral imaging (Nikon)

■Surface analyzers

  • JAMP-9500F Auger electron spectroscope (JEOL)

  • JPS-9200 X-ray photoelectron spectroscope (JEOL)

  • JXA-8530F Electron probe micro analyzer (FE-EPMA) (JEOL)

  • JAFM4500-LT Ultrahigh vacuum, ultralow temperature high-field SPM (JEOL)

  • LT-STM/AFM Ultrahigh vacuum STM/spin-polarized STM system (VT-STM) (Omicron)

■Sample production devices

  • FIB FB-2100 Convergence ion beam processing/observation system (Hitachi High-Technologies)

  • JIB-4600F/HKD FIB-SEM Combined beam processing/observation system (JEOL)

■Other Open Facility Instruments

These are not part of the nano-technology platform instruments,
but inquiries and technical support are available.

  • JSM-7001FA Field emission-type scanning electron microscope (JEOL)

  • JEM-2000FX Analysis TEM with a field emission-type electron gun (JEOL)

  • Ion slicer (JEOL)

  • Sample production devices

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Hokkaido University
Office for the Promotion of Nanotechnology Collaborative Research

c/o Creative Research Institution, Kita 21-jo Nishi 10-chome, Kita-ku, Sapporo

NanotechJapan

NanotechJapan

Advanced Characterization Nanotechnology Platform

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