Price list

  • Nanofabrication
  • Microstructure Characterization

Technical consultation fee

Technical consultation fee (yen/hr) 10,000
Technical assistance fee (Preprocessing, Design, etc) (yen/hr) 4,000

Nanofabrication support equipment price list (2018.10)

Equipment Model

Introductory training fee
(yen)

Usage fee
(yen/hr)

(Academic)

Usage fee
(yen/hr)

(Business Use)

Technical Support

(yen/hr)

(Academic)

Technical Support

(yen/hr)

(Business Use)

Technical Service

(yen/hr)

(Academic)

Technical Service

(yen/hr)

(Business Use)

Ultra-high precision electron-beam lithography system 125 kV ELS-F125-U 32,000 2,500 7,200 6,500 11,200 10,500 15,200
Ultra-high precision electron-beam lithography system 100 kV ELS-7000HM 32,000 1,600 6,200 5,600 10,200 9,600 14,200
Mask aligner MA-20 12,000 400 1,100 4,400 5,100 8,400 9,100
Laser lithography system DDB-201-200 20,000 700 2,800 4,700 6,800 8,700 10,800
Vacuum deposition system ED-1500R 20,000 500 1,000 4,500 5,000 8,500 9,000
Plasma CVD system PD-220ESN 20,000 1,200 4,000 5,200 8,000 9,200 12,000
Liquid source plasma CVD system PD-10C1 20,000 300 400 4,300 4,400 8,300 8,400
Helicon sputtering system MPS-4000C1/HC1 12,000 2,000 3,200 6,000 7,200 10,000 11,200
Ion beam sputter system IBS-6000S 12,000 700 1,200 4,700 5,200 8,700 9,200
Atomic layer deposition system SUNALE-R 12,000 1,900 4,100 5,900 8,100 9,900 12,100
ICP dry etching system SPM-200 20,000 1,300 3,600 5,300 7,600 9,300 11,600
Reactive ion etching system RIE-101iPH 12,000 1,600 3,700 5,600 7,700 9,600 11,700
Reactive ion etching system RIE-10NRV 12,000 900 2,700 4,900 6,700 8,900 10,700
Dry etching system NLD-500 12,000 800 1,400 4,800 5,400 8,800 9,400
Ion milling system IBE-6000S 12,000 600 900 4,600 4,900 8,600 8,900
Field emission-type scanning electron microscope JSM-6700FT 20,000 800 900 4,800 4,900 8,800 8,900
Electron beam lithography system ELS-3700 24,000

1,300

2,100 5,300 6,100 9,300 10,100
Electron beam lithography system ELS-7300 64,000 1,600 5,000 5,600 9,000 9,600 13,000
Double-side mask aligner MA-6 64,000 700 2,700 4,700 6,700 8,700 10,700
ECR processor EIS-200ER 40,000 900 1,500 4,900 5,500 8,900 9,500
ICP processor EIS-700S 24,000 1,000 1,000 5,000 5,000 9,000 9,000
Ultra-high vacuum helicon sputtering system Av028 24,000 1,200 2,300 5,200 6,300 9,200 10,300
ALD film formation system Savannah 100 24,000 1,400 2,700 5,400 6,700 9,400 10,700
Sputter system SPF-210H 24,000 300 500 4,300 4,500 8,300 8,500
EB heating/resistant heating-type deposition system EBX-8C 16,000 2,300 2,600 6,300 6,600 10,300 10,600
EB heating/resistant heating-type deposition system AV096-000 16,000 1,300 2,400 5,300 6,400 9,300 10,400
FIB processor EIP-3300 40,000 1,500 1,900 5,500 5,900 9,500 9,900
Easy tube system Easy tube system 40,000 400 400 4,400 4,400 8,400 8,400
Ellipsometer M-500S 8,000 200 700 4,200 4,700 8,200 8,700
High-speed scanning EB lithography system ELS-F130HM 32,000 5,500 25,500 9,500 29,500 13,500 33,500
PAC-LMBE Compact Laser MB PAC-LMBE 32,000 1,500 4,900 5,500 8,900 9,500 12,900
Surface Roughness Analysis SEM ERA-8000FE 32,000 1,100 1,200 5,100 5,200 9,100 9,200
Compact sputter system ACD-4000-C3-HS 12,000 1,100 2,900 5,100 6,900 9,100 10,900
ICP high-density plasma etching system RIE-101iHS 12,000 1,600 5,400 5,600 9,400 9,600 13,400

Nanofabrication device price list (PDF, download) 》

Technical consultation fee

Technical consultation fee (yen/hr) 10,000
Technical assistance fee (Preprocessing, Design, etc) (yen/hr) 4,000

Microstructure Characterization support equipment price list (2018.10)

Equipment Model Introductory training fee
(yen)

Usage fee
(yen/hr)

(Academic)

Usage fee
(yen/hr)

(Business Use)


Technical Support

(yen/hr)

(Academic)

Technical Support

(yen/hr)

(Business Use)

Technical Service

(yen/hr)

(Academic)

Technical Service

(yen/hr)

(Business Use)

Field emission-type scanning
electron microscope /FE-SEM
JSM-6500F 32,000 1,300 2,700 5,300 6,700 9,300 10,700
Ultrahigh vacuum, ultralow temperature
high-field SPM /SPM
JAFM4500LT 24,000 1,400 7,100 5,400 11,100 9,400 15,100
Multi-beam ultrahigh-voltage
electron microscope
JEM-ARM1300 28,000 3,400 4,900 6,900 8,400 6,900 8,400
Analysis TEM
with a field emission-type electron gun
JEM-2010F 28,000 2,300 2,300 5,800 5,800 5,800 5,800
Ultra-thin film evaluation system /STEM HD-2000 16,000 2,700 7,400 6,700 11,400 10,700 15,400
Convergence ion beam processing
/observation system /FIB
FB-2100 20,000 1,900 4,400 5,900 8,400 9,900 12,400
Electron microscope system
for environmental cells /TEM
JEM2010 32,000 1,200 2,800 5,200 6,800 9,200 10,800
Electron probe micro analyzer (FE-EPMA) JXA-8530F 32,000 2,700 7,900 6,700 11,900 10,700 15,900
Combined beam processing
/observation system /FIB-SEM
JIB-4600F/HKD 32,000 2,500 4,800 6,500 8,800 10,500 12,800

Combined beam processing
/observation system /FIB-SEM(with EDS)

JIB-4600F/HKD 0 300 800 300 800 300 800
Auger electron spectroscope /AES JAMP-9500F 28,000 2,300 8,100 5,800 11,600 5,800 11,600
X-ray photoelectron spectroscope /XPS JPS-9200 28,000 1,700 5,500 5,200 9,000 5,200 9,000
Spin SEM 24,000 2,000 2,400 6,000 6,400 10,000 10,400
Ultrahigh vacuum STM
/spin-polarized STM system
STM/AFM,VT-STM 24,000 2,500 4,200 6,500 8,200 10,500 12,200
Ultrahigh-speed time-resolved
photoelectron microscope system
PEEM-Ⅲ 128,000 2,600 5,700 6,600 9,700 10,600 13,700
Titan Transmission Electron Microscope FEI Titan3 G2 60-300 28,000 7,500 31,400 11,000 34,900 11,000 34,900
Atomic Resolution Analytical Electron Microscope JEM-ARM200F 40,000 4,500 16,000 8,500 20,000 12,500 24,000
Scanning Probe Microscope NanoNavi Station SPA300 32,000 200 400 4,200 4,400 8,200 8,400
Ultrahigh vacuum, ultralow temperature high-field SPM JAFM4500LT 192,000 1,000 1,500 5,000 5,500 9,000 9,500

Microstructure Characterization support equipment price list (PDF, download) 》

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Advanced Characterization Nanotechnology Platform

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